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US Patent Issued to Semes on Sept. 22 for "Apparatus for treating substrate and method for treating a substrate" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,020, issued on Sept. 22, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea). "Apparatus for treating substrate and method for... Read More


US Patent Issued to ASML Netherlands on Sept. 22 for "Prolonging optical element lifetime in an EUV lithography system" (Dutch, Belgian, American Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,021, issued on Sept. 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Prolonging optical element lifetime in an EUV li... Read More


US Patent Issued to Carl Zeiss SMT on Sept. 22 for "Projection lens, projection exposure apparatus and projection exposure method" (German Inventor)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,022, issued on Sept. 22, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Projection lens, projection exposure apparatus and pr... Read More


US Patent Issued to Applied Materials on Sept. 22 for "Methods and mechanisms for modifying machine-learning models for new semiconductor processing equipment" (California Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,024, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods and mechanisms for modifying machine-learn... Read More


US Patent Issued to Onto Innovation on Sept. 22 for "Substrate edge patterning techniques" (Massachusetts, New Hampshire Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,025, issued on Sept. 22, was assigned to Onto Innovation Inc. (Wilmington, Mass.). "Substrate edge patterning techniques" was invented by ... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 22 for "Critical dimension inspection method and semiconductor device manufacturing method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,026, issued on Sept. 22, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Critical dimension inspection method an... Read More


US Patent Issued to KLA on Sept. 22 for "Methods and systems for model-less, scatterometry based measurements of semiconductor structures" (California, Michigan Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,027, issued on Sept. 22, was assigned to KLA Corp. (Milpitas, Calif.). "Methods and systems for model-less, scatterometry based measuremen... Read More


US Patent Issued to GUDENG EQUIPMENT on Sept. 22 for "Reticle clamping module" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,028, issued on Sept. 22, was assigned to GUDENG EQUIPMENT Co. LTD. (New Taipei City, Taiwan). "Reticle clamping module" was invented by Yu... Read More


US Patent Issued to Applied Materials on Sept. 22 for "Digital photolithography system, components thereof and related methods" (American, Israeli, Indian Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,029, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Digital photolithography system, components thereo... Read More


US Patent Issued to Applied Materials on Sept. 22 for "Frequency and amplitude modulation of implant dose for stress management" (California Inventor)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,030, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Frequency and amplitude modulation of implant dose... Read More